Growth platform

Cluster with sputtering and thermal evaporation chambers.

Sputtering

— Coordinators: S. Collin, F. Godel

The laboratory has three sputtering chambers equipped with DC and RF cathodes. The materials deposited in thin or ultra-thin layers are of various types, with or without magnetic properties: pure metals, metal alloys, insulators. These chambers are coupled either to pulsed laser ablation reactors or to a thermal evaporation chamber (using an electron gun and joule effect), enabling development of hybrid heterostructures. Superconducting, ferroelectric, molecular or two-dimensional compounds can thus be combined with ferromagnetic materials.

Cluster with sputtering and thermal evaporation chambers.

Pulsed laser deposition

— Coordinators: C. Carrétéro, E. Jacquet

The laboratory has five reactors equipped with Nd-YAG solid-state lasers or KrF excimer lasers. These reactors enable a wide range of materials to be explored, including dielectric, ferroelectric, magnetic and superconducting oxides, as well as two-dimensional van der Waals materials. Three of these reactors are connected in-situ and coupled to two sputtering chambers for the elaboration of oxide/metal heterostructures. In-situ characterization facilities (RHEED, LEED, XPS, UPS) are connected to the growth chambers.

Cluster with three reactors, two sputtering chambers and equipped with various analysis setups (RHEED, LEED, XPS).
ALD reactor for ultra-thin dielectric films growth.

Chemical Vapor Deposition (ALD and CVD)

— Coordinators: S. Collin, F. Godel

Two reactors (ALD and CVD) are dedicated to the deposition of ultra-thin films using molecular precursors. The ALD reactor is used to produce thin dielectric layers and ferromagnetic metal layers. Two-dimensional materials such as graphene are produced in the CVD reactor on metallic substrates (ferromagnetic or not). These two reactors are linked by an ultra-high vacuum transfer case to the sputtering chamber, enabling hybrid spintronic heterostructures growth.

ALD reactor for ultra-thin dielectric films growth.

Deposition of molecular compounds

— Coordinators: S. Collin, F. Godel

In order to integrate molecular compounds into devices, the laboratory is equipped with a thermal evaporation chamber and glove boxes. The thermal evaporation chamber, coupled to sputtering chamber, is dedicated to the ultra-high vacuum deposition of organic semiconductors for the production of organic/inorganic hybrid heterostructures. Glove boxes are used to form self-assembled monolayers of molecules in solution under a controlled atmosphere. A transfer case connects the glove boxes to the ALD, CVD and sputtering chambers.

Coupled glove boxes for the formation of self-assembled monolayers of molecules in controlled atmosphere.